Degradation of Phenolic Compound’s in Annular Photo-Reactor Using H2O2/UV Process

Authors

  • Beenu Boudh Department of Chemical Engineering, Madhav Institute of Technology and Science, Gwalior, M.P, India
  • Nitin Kumar Verma Department of Chemical Engineering, Madhav Institute of Technology and Science, Gwalior, M.P, India

DOI:

https://doi.org/10.37591/jowppr.v2i2.490

Keywords:

Advance oxidation process, phenol, UV/ H2O2 photo catalytic process, UV-Spectrometer analysis

Abstract

Advance oxidation process is one of the best treatment applications for the remediation of water, waste water, odour, sludge and traditionally used for the removal of organic contaminant. The advance oxidation process introduced UV mediate process where an oxidant and UV frequency are applied. This process uses the photo chemical oxidation of phenol in a batch recycle photochemical reactor using UV irradiation/hydrogen peroxide. In this paper, the parameters used such as absorption time, optimum degradation time and optimum dosages required for degradation of phenol. The collected samples were analyzed through the UV spectrometer. The results indicate 66, 98, 98.1 and 98.3% degradation of phenol respective with in 10, 20, 30, and 40 min of radiation time. The experimental results showed that the optimum condition is obtained at a pH value 5, 6 and 7 with H2O2 concentration ranging from 2, 4, 6, 7 and 8 ml/L for UV/H2O2 system

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Published

2019-04-19

Issue

Vol. 2 No. 2 (2015)

Section

Articles

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