Effect of Annealing on Structural and Surface Properties of Nanostructured ZnO Thin Films

Authors

  • T. Shiyani Department of Physics, Saurashtra University, Rajkot, Gujarat, India Department of Nanotechnology, VVP Engineering College, Gujarat Technological University, Rajkot, Gujarat, India.
  • U. D. Khachar Department of Physics, Saurashtra University, Rajkot, Gujarat, India
  • R. Mansuriya Department of Physics, Saurashtra University, Rajkot, Gujarat, India
  • P. Solanki Department of Physics, Saurashtra University, Rajkot, Gujarat, India
  • R. Doshi Department of Physics, Saurashtra University, Rajkot, Gujarat, India
  • P. Vachhani Department of Physics, Saurashtra University, Rajkot, Gujarat, India
  • J. H. Markna Department of Physics, Saurashtra University, Rajkot, Gujarat, India Department of Nanotechnology, VVP Engineering College, Gujarat Technological University, Rajkot, Gujarat, India
  • D. G. Kuberkar Department of Physics, Saurashtra University, Rajkot, Gujarat, India

Keywords:

ZnO, thin film, microstructure, annealing

Abstract

ZnO thin films with different grain size were grown on amorphous quartz substrate using spin coating method. We have reported the effect of annealing temperatures on the structural and surface properties of ZnO thin films. The surface properties were characterized by AFM. From XRD analysis, it can be seen that, the FWHM decreases with an increase in annealing temperature from 500 to 575ºC which is reflected in the increase in the particle size with annealing temperature. The grains are well developed in nature with the size ranging between 100 and 200 nm and the height of the grains range between 25 and 55 nm. The absorption spectrum in the UV-visible range of ZnO film was taken to confirm the diameter of nanoparticle. The value of the average diameter (D) of ZnO particle in the CSD grown film is estimated to be ~10 nm, which is in the range of the particle size obtain from XRD.

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Published

2020-07-13

Issue

Vol. 6 No. 3 (2016)

Section

Review Article